Hi all,

    I would like to know whether there is someone who have faced a
problem that cannot etch parylene C througoutly. After ethcing a polymer
(Parylene C) layer inside a oxygen plasma (used photoresist AZ5214 as a
mask), the PR was removed inside acetone. After that, I tried to etch
this polymer layer again but it cannot be etched througoutly (remain
around 300A in thickness).
    I have a friend who can etch thro. parylene but I can't, is there
any possibility to cause this kind of problem...e.g.. after I used
ethanol in my process..parylene can't be etch? What process will lead to
the parylene can't be etched? Do you have any suggestion of this
problem?
    Thank you very much.

Best regards,
Carmen