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  • Re: effective dielectric constant (Stephan Biber)
  • More on mnemonics for cantilever displacement (Vaughan Pratt)
  • problem: deep trenches during DRIE ([email protected])
  • polyimide resistant to KOH etch (tennyson nguty)
  • KOH etching problems (Luc Bijnens)
  • Rhodium plating (Choe,S-H)
  • Effective Dielectric Constant of a Suspension of Spheres (David Nemeth)
  • BST thin film phase shifter (Mr. Indrajit Paul)
  • Etching Problem ([email protected])
  • KOH etching problems (Z.,W.Y.(Lydia))
  • Flow rate for therma wet oxidation (R. Brent Garber) (2 parts)
  • problem: deep trenches during DRIE (Kirt Williams)
  • problem: deep trenches during DRIE (Tony Li)
  • Re: More on mnemonics for cantilever displacement (Vaughan Pratt) (Vaughan Pratt)
  • polyimide resistant to KOH etch (Gert Eriksen)
  • MEMS testing ([email protected])
  • Re: effective dielectric constant (Xin Wu)
  • wet oxidation of silicon (Isa Kiyat)
  • Re: Rhodium plating (Jordan M. Berg)
  • BCB baking (Manuel Muñoz)
  • Modeling MEMS with Femlab (Isabelle PF Harouche)
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