try
www.soitec.com
www.sigen.com



>-----Ursprüngliche Nachricht-----
>Von: Marcus Siegert [mailto:info@siegertcon.com]
>Gesendet: Donnerstag, 7. August 2003 19:56
>An: mems-talk@memsnet.org
>Betreff: [mems-talk] need thin film SOI wafers
>
>
>Hi MEMS-People:
>
>I am looking for thin-film-soi-wafers.
>
>Following specification is required:
>
>Device-layer:
>Diameter: 150 mm
>Type: n-type
>Orientation:<100>
>Thickness: 300 nm - 500 nm
>Resistivity: 0.3 (let me know what range you can offer!!!)
>
>BOX:
>2000 - 5000 angstrom, please specify!!!)
>
>Handle:
>Dopant: any
>Orientation: any
>Resistivity: any
>Thickness: > 400 µm
>Flatness: <5µm
>
>All other specification are N/S.
>
>Quantity: 25 pcs.
>
>Please let me know who can supply such specification???
>
>Thanks and regards,
>
>Marcus SiegertFrom michael.martin@louisville.edu Thu Aug 07 14:35:08 2003
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>Date: Thu, 07 Aug 2003 14:34:39 -0400
>From: "Michael D Martin" 
>To: 
>Subject: RE: [mems-talk] Ag-AgCl electrode
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>
>The bleach will also etch Titainium! It seems like I've seen other
>solutions used for generating Ag-AgCl. Will your device tolerate KCl? If
>so look into using that.
>
>-Mike
>>>> Jason.Viotty@c2v.nl 08/07/03 03:39AM >>>
>Hiroaki, I think that the problem you saw with the Cr adhesion layer is
>due
>to the fact that the Cr is atacked by the chlorine. HCl is a known
>etchant
>for Cr, so I would expect for it to also be atcked by that chlorine
>based
>solution you used. You could probably try using Ti or Ta as the
>adhesion
>layer. For as far as I know, these are not attacked by HCl. You would
>have
>to see however if these metals are compatable with the rest of your
>processing. Ti for example is attacked by HF-based solutions and by
>KOH.
>Ok, succes.
>
>Jason
>
>___________________________________________________________
>Jason Viotty
>Senior Process Engineer
>C2V
>http://www.c2v.nl
>___________________________________________________________
>
>
>
>-----Original Message-----
>From: Hiroaki SUZUKI [mailto:hsuzuki@iis.u-tokyo.ac.jp]
>Sent: woensdag 6 augustus 2003 2:52
>To: General MEMS discussion
>Subject: [mems-talk] Ag-AgCl electrode
>
>
>Hi all
>
>Has anyone tried to pattern an Ag-AgCl electrode on either glass or
>siliocon
>substrate? I deposited and patterned Ag and immersed in chlorine based
>bleach solution, but Ag easily peels off.
>
>Although Ag-AgCl electrode is very often used for the electrical
>detection
>of biological stuff, I don't see it in Bio-MEMS literatures. Most
>people use
>Ti/Au or Cr/Au electrode. But in my observation, Cr as an adhesion
>layer
>elutes when the current flows and the electrode peels off as well.
>
>Any suggestion/discussion would help.
>Thanks,
>
>----------------------------
>Hiroaki SUZUKI
>The University of Tokyo
>Institute of Industrial Science (IIS)
>----------------------------
>
>
>
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