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polysilicon stiction problem
2003-10-24
Saurabh Nishant
2003-10-24
kris
2003-10-27
Shweta Humad
2003-10-24
Bill Moffat
2003-10-24
Jobert van Eisden
2003-10-27
Burkhard Volland
2003-10-27
Esko Forsén
polysilicon stiction problem
Burkhard Volland
2003-10-27
Hello,

[polysilicon anti-stiction]

maybe you should increase the surface roughness of your cantilever. This
could be done by etching some pyramid structures (or simply some lens-shaped
bumps by isotropical etching) into your sacrificial layer before the
depostion of the polysilicon.
Or, you could deposit a layer of tensile stress material on top of your
cantilevers prior to release, in order to compensate for the intrinsic
stress of the polysilicon layer.

Best regards, Burkhard
-----Ursprüngliche Nachricht-----
Von: Saurabh Nishant 
An: mems-talk@memsnet.org 
Datum: Freitag, 24. Oktober 2003 16:00
Betreff: [mems-talk] polysilicon stiction problem


>Dear MEMS colleagues,
>  I am a student at indian institute of science and facing the problem of
stiction in polysilicon cantilivers after sacrificial layer etching.I would
appreciate if any one can suggest me some means to overcome this problem.I
suspect both the resifual stress and capillary forces are reponsible.Any
help would be highly appreciated.
>thanks.
>
>regards
>nishant



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