I was trying to spin coat aluminium with shipley 1818 negative resist.
But when I used a wet etching solution the resist wasn't able to
withstand the etchant. My patterns are on the scale of microns and
the best way to etch is through wet etching because i need to remove
alomost 300 micron thick aluminum. Does anyone know the steps to spin
a thick layer of resist that will withstand the etchant that is made
up of Hcl and CuCl2. I have SU-8 and 1818 to my disposal. I also
need to remove the resist after the etching process.
Thank you,
Vivek Mukhatyar