How to remove AZ photoresist in SU-8 microchannel?
Steven Yang
2008-01-30
Hi, all
Always got question on microfabrication.
This one is, I use AZ5214 to pattern a OTS (a silane to modify Si
surface) at the the bottom of my SU-8 microchannel. After that, I need
to clean all AZ PR off from SU-8 channel without any damage to SU-8
and OTS layer at bottom, as well as a Cr/Au layer.
I heard the acetone will swell the SU-8, so this is not the right
chemical I can use because it will destroy my critical pattern made by
SU-8.
RIE descum also not a good idea, as it will remove the OTS layer too.
So, which chemical or process I can use to clean the photoresist clearly?
Thanks and regards,
Steven