Lift-off method for ALD deposited Al2O3 with PMMA
pattern
Michael D Martin
2008-08-29
Try some ultra sonic cleaning in acetone or a surfactant. Part of the problem
may be that you have a conformal layer that you are trying to lift off. In the
event that the PMMA is hardened you might try some Nanostrip (I think aluminum
oxide will be OK) or N-methyl pyrrollidone (NMP).
Good luck,
Michael
>>> "Jun Huang" 8/29/2008 9:52 AM >>>
Hi, all,
The structure of our device composed of silicon/Patterned PMMA(~200
nm)/ALD Al2O3 (~40 nm). I have tried to dip the device in acetone to do
lift-off but the Al2O3 layer on the entire substrate surface does not
lift-off. It seems that either acetone can not penetrate the Al2O3 layer or
the PMMA layer is hardened. The deposition temperature for ALD Al2O3 is ~
150 C which should not be high enough to harden PMMA.
Does anyone have any suggestions on the lift-off process?