Hi All,
I need to deposit a photoresist of thickness about 5um, and pattern it in
order to relize structures of lateral sizes 4x1000um. I tried using AZ9260
photoresist, but i had adhesion problems after development step.
I used HMDS as adhesion promoter.
I also tried to use a O2 plasma before photoresist spinning, but it did
not helped.
Any suggestions to improve photoresist adhesion ?
Best regards,
Andrea