Hi
There is an article published in IEEE MEMS 1998 Proceedings
that deals with SU-8.
"Taguchi Optimization for the processing Epon SU-8 resist"
B.Eyre,J.Blosiu and D.Wiberg
Center for Space Microelectronics Technology
Jet Propulsion Laboratory
California Institute of Technology
Pasadena,CA 91109
Optimized process variables such as softbake time,exposure time,
post-exposure time,develop time and sustrate type for SU-8 with
73% solvent was obtained.
Hope this could be of help.
Regan Nayve
Zeng Yi wrote:
>
> Dear Members:
> I am new student in MEMS. Now I am concerning to use SU-8
> photoresist for some microstructures. But I do not know how to
> control the depth of the SU-8 layer? Could anyone tell me something
> about that? Thank you for your time and consideration.
> Zeng Yi
>
>