High contrast photoresist for interference lithography
On 1/15/2013 1:03 PM, Daniel Figura wrote:
> High resolution is relative - what L/S resolution do you need? Limiting
> factor can be photo resist contrast but very often exposure system.
I'm trying to print dense lines with a period of 3000 l/mm currently.
So, approximately 170 nm linewidth. I have gotten good results with SPR
220, as I mentioned. But this was with a different exposure setup. I
will verify that we can obtain similar results with the current setup.
> Some time ago I made a list of commercially available UV photo resists
> http://www.smartfabgroup.com/photoresists.php have a look.
Thank you. I found your list some time ago and have found it very
useful to get an overview of various resists.
Justin M. Hannigan, Ph.D.
Process Development Engineer
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Eugene, OR 97402
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