I am trying to coat an SU8 material on ITO etched glass. I have a
problem that during development the SU8 lifts off the glass very easily.
if the glass sheet is immersed in the developer the SU8 lifts off and
I believe that this is a baking problem (too much or not enough) after
coating the SU8. I am using a two step kiln 65 degrees ( 1 min) and 95
degrees (4 min). The same settings for post exposure bake.
Has anyone seen a problem like this?
Mr. Janis Klavins
Hosted by the MEMS and Nanotechnology Exchange, the country's leading
provider of MEMS and Nanotechnology design and fabrication services.
Visit us at http://www.mems-exchange.org
Want to advertise to this community? See http://www.memsnet.org