Patrick,
        Question 1 depends upon the type and viscosity of the Polymide.
Question 2depends upon the hardbake temperature of the Polymide and the type of
Plasma system.  For example in a microwave high power resist stripper like the
YES 108 you can remove about 8 microns of hard baked Polymide in about 5 minutes
in a barrel plasma unit 13.54 M/Hz think many hours.  If you have more specific
details let me know and I will give you more specific answers.  Bill Moffat

-----Original Message-----
From: Patrick Carlberg [mailto:patrick.carlberg@ftf.lth.se]
Sent: Tuesday, March 11, 2003 3:01 AM
To: mems-talk@memsnet.org
Subject: [mems-talk] Questions on Polyimide


Dear all,

Does anyone know the approximate thickness of Polyimide on Si spun at
3000rpm or the etching rate in O2-plasma.

Sincerely
Patrick Carlberg


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