Bill

I'm currently running another liftoff test with HMDS prime prior to applying
the LOR.  I prepared 3 Pyrex wafers:  One wafer was spin primed, the other
two were vapor primed for 10 and 60 seconds a YES oven.  Hopefully I will
have better results this time.  If not I'll send you a couple of the Pyrex
wafers.

Thank you
Roger Shile


----- Original Message -----
From: "Bill Moffat" 
To: "General MEMS discussion" 
Sent: Tuesday, March 11, 2003 8:01 AM
Subject: RE: [mems-talk] Liftoff on Pyrex


Roger,
      I think a vacuum vapor prime with HMDS will help you with adhesion.  I
am not familiar with Microposit LOR 10A, but you are trying to stick an
organic onto a non organic.  A molecule that constitutes an
inorganic/organic mix can only help.  Good news a vacuum vapor prime once
applied is not affected by the moisture in the air.  This means I can prime
the samples here and ship them back with better adhesion.  Can you send me
some samples.  Bill Moffat

-----Original Message-----
From: Roger Shile [mailto:rshile@nanoink.net]
Sent: Monday, March 10, 2003 2:33 PM
To: General MEMS discussion
Subject: [mems-talk] Liftoff on Pyrex


I am attempting to pattern Cr/Au films on Pyrex by liftoff.  However the I
am getting unacceptable results due to poor adhesion of the liftoff resist.
my process is as follows:

Clean Pyrex in Piranha, DI rinse, blow dry.
Dehydration bake 30 minutes ~ 200 degC
Spin on Microposit LOR 10A
Bake 30 min 150-190 degC
Spin on S1813 resist
Bake 30 min at 90 degC
Expose and develop
Bake 30 min at 90 degC (to avoid outgassing during sputter)
Sputter 100A Cr + 1 Micron Au

My understanding was that HMDS prime isn't necessary prior to application of
LOR or LOL.  I had good results with the above process on Si.
Would a HMDS prime improve LOR adhesion to Pyrex?  If so what is an ideal
prime e.g. resulting contact angle for water drop?

Is there some other technique to improve LOR/LOL adhesion to Pyrex?

Roger Shile
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