How to remove scallop polymer residual after STS2 DRIE
Mehmet Yilmaz
2015-12-14
Hello again Youmin,
Unfortunately, I am not an expert on the chemistry of the ALEG 380. I do
not know how it works...
I just remember very vividly that I used ALEG 380 for a 8-10 hours long
process to remove a big chunk of BOSCH process polymer from a specific
region while the rest of the wafer was also exposed to ALEG 380. I worked
with SOI wafer. When I used ALGE 380, silicon dioxide surfaces (BOX), and
"silicon device layer" surfaces were exposed ALEG 380. I do not remember
oxide or Si being etched in the end of 8-10 hours long polymer removal
session at 80 degrees Celcius.
Regards,
Mehmet
On Mon, Dec 14, 2015 at 7:39 PM, Youmin Wang
wrote:
> Hello Mehmet,
>
> Thank you very much for your suggestions!!
>
> I have worked with EKC270 from DuPont:
>
> http://www.dupont.com/content/dam/assets/products-and-services/electronic-
electrical-materials/assets/EKC/EKC270.pdf
>
> I think they both remove the polymer and try to "lift off" the residue by
> etching the substrate slightly? Thanks in advance for your comments.
>
>
> Best,
> Youmin
>
> On Mon, Dec 14, 2015 at 9:28 AM, Mehmet Yilmaz
> wrote:
>
>> Dear Youmin,
>> You may try ALEG 380. The link for the product is below:
>>
>> http://www.avantormaterials.com/Electronic-Materials/Markets-and-Applications
/Semiconductor-Chemicals/Post-Etch-Residue-Removal.aspx
>>
>> I used ALEG 380 at 80 degress Celcius temperature. And it definitely
>> worked in my case. However, I see that your features are way more smaller
>> than what I had when I used ALEG 380. My lines and spaces were 2um/2um.
>>
>> I hope this helps! Good luck!
>>
>> Bests,
>>
>> Mehmet
>>
>> On Sun, Dec 13, 2015 at 9:32 PM, Youmin Wang
>> wrote:
>>
>>> Hello Everyone,
>>>
>>> I want to etch the silicon structure below to half of its heigh (from
>>> 2un to 1um) in standard BOSCH process:
>>>
>>> [image: Inline image 1]
>>>
>>> However I got a lot of sidewalls un-removed:
>>>
>>> [image: Inline image 2]
>>>
>>>
>>> I tried with EKC270 post-etch cleaning but there are still quite a few
>>> sidewalls still there, topview is like:
>>>
>>> [image: Inline image 3]
>>>
>>> Do you think whether my etching recipe has any problem, or you know
>>> whether I can do something post-etch to clean those standing sidewalls?
>>> Thanks a lot!
>>>
>>>
>>>
>>> Best,
>>> Youmin
>>>
>>>
>>>
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>