Dear all,
Does anybody know what the etch rate of SU-8 in O2 plasma is?
I have patterned 4 micro-m SU-8 film and plan to etch it in O2 plasma.
I wonder how much the etch rate will be.
Is it possible to etch SU-8 in pure O2 plasma or do I need O2/CF4 mixture gas?
I do not need fast etch rate ( may be 2~3 micro-m/hour)
Thanks in advance.
Jack