MEMS-talk

News	MEMSnet Home: MEMS-Talk: What is the etch rate of SU-8 in O2 plasma? What is the etch rate of SU-8 in O2 plasma? 2003-03-07 S.O. Ryu What is the best first layer for the multi-layer process? 2003-03-07 Park, Sang Won (Daniel) 2003-03-07 [email protected] 2003-03-10 Isaac Wing Tak Chan 2003-03-13 Greg Reimann 2003-03-13 Christopher F. Blanford 2003-03-14 Isaac Wing Tak Chan 2003-03-13 Isaac Wing Tak Chan 2003-03-12 [email protected] 2003-03-13 Isaac Wing Tak Chan What is the etch rate of SU-8 in O2 plasma? Isaac Wing Tak Chan 2003-03-10 Hi, May I add a question? I've tried to ash SU-8 with O2 plasma in ICP/RIE system. But there is a film of residue on wafer. Have you seen such problem? Isaac On Fri, 7 Mar 2003 [email protected] wrote: > What type of reactor do you have? Is it a barrel asher or a single wafer system. OUr experience with oxygen and su8 shows it will ash but it is better if you have not done the second bake. This has been done in an icp/rie system and the etch rate is a little less than other negative working photoresists. Bob Henderson > > _______________________________________________ > [email protected] mailing list: to unsubscribe or change your list > options, visit http://mail.mems-exchange.org/mailman/listinfo/mems-talk > Hosted by the MEMS Exchange, providers of MEMS processing services. > Visit us at http://www.memsnet.org/ > Yours sincerely, Isaac Chan Ph.D. Candidate Dept. Electrical & Computer Engineering University of Waterloo 200 University Ave. W Waterloo, Ontario, Canada N2L 3V1 Tel: (519) 729-6409, ext. 6014 Fax: (519) 746-6321 [email protected] http://www.ece.uwaterloo.ca/~a-sidic reply
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