Transene's Silox Vapox III is 30% or 40% Ammonium Fluoride w/ 4% HF, and it is
loaded with Aluminum to retard it's attack.  It will etch SiO2 at about
4000A/min @ RT, without significant etch of Aluminum.

Someone else, Olin Hunt, maybe, made a Pad Etch called ' 777 ' that is about the
same type of product.

Neal Ricks

Fab Manager
Shipley Co., LLC
EIF Division
Opto Group - Blacksburg

bobo  wrote:
Dear all,
does anyone knows what wet etchant can etching silicon dioxide without etching
aluminum at the same time? Thanks.
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