Transene's Silox Vapox III is 30% or 40% Ammonium Fluoride w/ 4% HF, and it is
loaded with Aluminum to retard it's attack.  It will etch SiO2 at about
4000A/min @ RT, without significant etch of Aluminum.

Someone else, Olin Hunt, maybe, made a Pad Etch called ' 777 ' that is about the
same type of product.

Neal Ricks

Fab Manager
Shipley Co., LLC
EIF Division
Opto Group - Blacksburg

bobo  wrote:
Dear all,
does anyone knows what wet etchant can etching silicon dioxide without etching
aluminum at the same time? Thanks.
_______________________________________________
[email protected] mailing list: to unsubscribe or change your list
options, visit http://mail.mems-exchange.org/mailman/listinfo/mems-talk
Hosted by the MEMS Exchange, providers of MEMS processing services.
Visit us at http://www.memsnet.org/

---------------------------------
Do you Yahoo!?
The New Yahoo! Search - Faster. Easier. Bingo.