Because previously I was using THB120N which had obsoleted, and SU8 was
suggested as replacement. I already have photo masks for negative resist,
therefore I continue to do evaluation for SU8.
I post exposé bake at 95C for 120S, while my plating temp is at ~45C for 24min.
I thought this plating temp is not high enough to harden the SU8?
On 3 Apr, 2013, at 16:52, André Bödecker wrote:
> Dear Jocelyn,
> what is the reason for you to use SU-8? This resist is designated as a
> permanent resist so it is quite unsuitable for plating processes in the case
> you want to remove it afterwards. For such applications I would recommend a
> normal positive resist.
> Best regards,
> André Bödecker
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